Super-resolution fluorescence microscopy on E-beam resist film during electron beam exposure for mask patterning process

The fabrication of highly qualified patterns for photomasks using an electron beam writer is one of the key methods to achieve the requirements for high-end semiconductor devices manufacturing. Полный текст публикации CiteX не хранит — доступ к первоисточнику открывается по DOI согласно лицензии издателя и выбранному плану.